File:Isolation pitch vs design rule.PNG

The graph is based directly on data (presented at five IEDM conferences) from Intel process technology from the 180 to 32 nm nodes.^[1]^[2]^[3]^[4]^[5]^[6]

References

^ S. Yang et al., IEDM 1998.
^ S. Tyagi et al., IEDM 2000.
^ S. Thompson et al., IEDM 2002.
^ P. Bai et al., IEDM 2004.
^ K. Mistry et al., IEDM 2007.
^ S. Natarajan et al., IEDM 2008.

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[1] S. Yang et al., IEDM 1998.

[2] S. Tyagi et al., IEDM 2000.

[3] S. Thompson et al., IEDM 2002.

[4] P. Bai et al., IEDM 2004.

[5] K. Mistry et al., IEDM 2007.

[6] S. Natarajan et al., IEDM 2008.

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